🌿 Extra soothing care after acne
The Dr.Althea 345 Relief Cream Mask is a vegan cellulose sheet mask for extra soothing of skin that is red, dry or stressed after acne. The manufacturer highlights 30% tea leaf water and soothing ingredients derived from centella.
✨ What does it do?
- Helps alleviate the unpleasant skin sensation remaining after acne.
- Provides intensive moisture replenishment within 10–15 minutes.
- Built on 30% tea leaf water.
- Supports a calmer skin feeling with centella ingredients.
- Well-adhering vegan cellulose sheet aids even distribution of the essence.
🧬 Key active ingredients
30% tea leaf water
The formula’s highlighted soothing base for caring for problematic, post-acne skin.
Centella complex
Components derived from centella support the comfort of red, stressed skin.
Hydrating essence
The mask provides abundant moisture so that dry, tight skin feels softer.
🎯 Who is it recommended for?
For red, sensitive or dehydrated skin after acne, when a quick soothing and hydrating extra step is needed.
💗 Why do we love it?
Because the 345 line’s targeted soothing approach is transferred into a quick, well-adhering sheet mask.
❓ Q&A
How long should it stay on?
10–15 minutes, then remove and pat in the remaining essence.
Should it be rinsed off?
No.
Can it be used on active acne?
The brand positions it for soothing problematic and post-acne skin; however, do not apply to damaged, open skin areas.
Aqua (Water), Tea Tree Leaf Water, Methylpropanediol, 1,2-Hexanediol, Butylene Glycol, Glycerin, Niacinamide, Octyldodeceth-16, Triethylhexanoin, Caprylic/Capric Triglyceride, Pentylene Glycol, Carbomer, Hydroxyethylcellulose, Tromethamine, Allantoin, Trehalose, Caprylyl Glycol, Ethylhexylglycerin, Dipotassium Glycyrrhizate, Disodium EDTA, Panthenol, Soybean Seed Extract, Sodium Hyaluronate, Hydrolyzed Hyaluronic Acid, Pantothenic Acid, Centella Asiatica Leaf Water, Cyclodextrin, Centella Asiatica Extract, Hydrogenated Lecithin, Madecassoside, Ceramide NP, Cholesterol, Camellia Sinensis Leaf Water, Resveratrol, Beta-Glucan, Sodium DNA, Nelumbo Nucifera Leaf Extract
*Ingredients may vary at the manufacturer’s discretion. The most complete and up-to-date list of ingredients can be found on the product packaging.
*Ingredients may vary at the manufacturer’s discretion. The most complete and up-to-date list of ingredients can be found on the product packaging.
After cleansing the face, prepare the skin with toner. Smooth the mask onto the face, leave on for 10–15 minutes, then remove. Gently pat the remaining essence into the skin. Do not rinse off.
Usage precautions:
1. It is recommended to perform an allergy test (patch test) before first use (e.g. on the inner forearm).
2. If you experience any abnormal symptoms or side effects such as redness, swelling or itching, discontinue use and consult a professional if necessary.
3. Do not use on damaged or wounded areas.
4. Keep out of reach of children and away from direct sunlight.
5. If it gets into the eyes, rinse immediately.
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